ChipsTom's Hardwareabout 2 hours ago
Samsung delays High-NA EUV to 1nm node
3 min read
Samsung Foundry will delay full commercial use of High-NA EUV lithography to its 1nm process node, with chips expected around 2030. Its 2nm and 1.4nm nodes will use standard 0.33 NA EUV with multi-patterning because the supporting ecosystem remains immature.
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