ChipsThe Next Webabout 2 hours ago
UBS: China unlikely to match ASML EUV this decade
1 min read
UBS analysts say China's lithography programme is at roughly ASML's 2004 stage and will not produce a viable EUV alternative within a decade. China should reach high-volume immersion DUV manufacturing in two to five years, a category the Dutch government controls via export licences.
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