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The latest silicon carbide news, distilled by AI into sharp ~100-word summaries. ByteBrief tracks silicon carbide across dozens of tech sources and brings you only what matters, updated hourly. Tap any story for the full brief, or open the original source.

Kyoto University built a silicon carbide transistor operating at 600°C using standard ion implantation. A bottom-gate design and double-well isolation cut threshold voltage drift to under 0.1V at 400°C, down from over 2V. Work by Kaneko, Shibata, and Kimoto appears in APL Electronic Devices.
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